Toppan Photomasks Inc. on Monday announced plans to expand its Shanghai facility, adding capacity to produce photomasks used to manufacture semiconductor devices with 180 nanometer design rules, and additional lithography and inspection capacity for 250nm-and-above products.The expansion is the fourth since the company opened the facility in 1996 and will add clean room space and enhanced process, inspection, and repair capabilities to supply current demand and forecasted growth in China. The factory currently produces photomasks for geometries down to 250nm. Toppan built the Shanghai site in a joint venture with Shanghai Institute of Microsystem and Information Technology (SIMIT).
Toppan Photomasks Expands Shanghai Location
Jul 10, 2006